Plenarvorträge - DPG-Tagungen
Plenarvorträge - DPG-Tagungen
Plenarvorträge - DPG-Tagungen
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Halbleiterphysik Donnerstag<br />
nes Germanium aufgefasst werden. Laterale Variationen im strukturellen<br />
Übergang machen sich im Wesentlichen in der zweiten und dritten Lage<br />
bemerkbar.<br />
[1] N.I. Borgardt et al., Ultramicroscopy 90 (2002), 241.<br />
HL 44.63 Do 16:30 Poster A<br />
Reifung von Versetzungsringen in Silizium während Aluminiumgettern<br />
— •Carsten Rudolf, Yue-Lin Huang und Michael<br />
Seibt — IV. Physikalisches Institut der Universität Göttingen, Tammannstrasse<br />
1, D-37077 Göttingen, Deutschland<br />
Wir haben die Reifung von extrinsischen Versetzungsringen in Si<br />
während Aluminiumgettern (AlG) untersucht. Das Ziel war herauszufinden,<br />
ob beim AlG an der Grenzfläche zwischen der Al:Si-Schmelze<br />
Eigenfehlstellen entstehen und in das Si-Substrat eindiffundieren.<br />
Extrinsische Versetzungsringe sind Ausscheidungen von Eigenzwischengitteratomen<br />
und reagieren auf Ströme von Eigenfehlstellen durch<br />
Wachstum oder Schrumpfen. Mit Dunkelfeld-Transmissionselektronenmikroskopie<br />
haben wir die Anzahl der in den Versetzungsringen<br />
gespeicherten Atome vor und nach AlG sowie in Referenzproben ohne<br />
Al-Schicht in Abhängigkeit von der Dauer der Temperaturbehandlung<br />
gemessen.<br />
Der Vergleich der gegetterten Proben mit dem Ausgangsmaterial deutet<br />
auf eine schwache Injektion von Eigenzwischengitteratomen hin. Die<br />
Messungen an den Referenzproben zeigen allerdings eine vergleichbare<br />
Injektion, so dass sich insgesamt schließen lässt, dass das AlG die Konzentration<br />
von Eigenfehlstellen nicht wesentlich beeinflusst.<br />
HL 44.64 Do 16:30 Poster A<br />
UHV-wafer bonding of heterostructure semiconductor materials<br />
using low energy hydrogen ion beam surface cleaning<br />
— •Nasser Razek 1 , Axel Schindler 1 , Volker Gottschalch 2 ,<br />
Gerald Wagner 3 , and Bernd Rauschenbach 1 — 1 Leibniz-Institut<br />
für Oberflächenmodifizierung e. V., Permoserstrasse 15, D-04318 Leipzig,<br />
Germany — 2 Universität Leipzig, Institut für Anorganische Chemie,<br />
Linnestr. 3, 04103 Leipzig — 3 Institut für Nichtklassische Chemie e. V.,<br />
Permoserstr. 15, 04318 Leipzig, Germany<br />
A room temperature wafer bonding process without applying external<br />
pressure based on low energy hydrogen ion beam (300 eV) surface cleaning<br />
has been studied for GaAs and other III-V-semiconductors. Successful<br />
bonding has also been performed between III-V-wafers and Si or Ge, respectively.<br />
X-ray photoelectron spectroscopy, atomic force microscopy,<br />
ultrasonic microscopy, HR-TEM cross section, photoluminescence and<br />
electrical characterization and post-processing steps were performed to<br />
evaluate the ion beam treated surfaces and the formed bonded interfaces.<br />
HL 44.65 Do 16:30 Poster A<br />
Inhomogeneities in Au:GaAs(110) Schottky Barriers Studied<br />
with Cross-sectional Scanning Tunneling Spectroscopy —<br />
T.C.G. Reusch, •M. Wenderoth, and R. G. Ulbrich — IV.<br />
Physikalisches Institut, Universität Göttingen, D-37077 Göttingen<br />
Inhomogeneities in Au:GaAs(110) Schottky barriers have been investigated<br />
with Cross-Sectional Scanning Tunnelling Spectroscopy. The influence<br />
of metal-induced gap states and the electrostatic potential of<br />
the depletion layer are visible in spatially resolved measurements. The<br />
electrostatic potential of the depletion layer shifts the current onsets in<br />
the tunneling spectra. By extracting the shift and from comparison with<br />
simulations, we are able to map variations in the local electrostatic potential<br />
in the depletion layer parallel and perpendicular to the interface<br />
on a near-atomic scale. This information is complementary to Ballistic<br />
Electron Emission Microscopy. The extracted SBH is in the range of 690<br />
meV , which is somewhat smaller than the reported SBH of 950 meV for<br />
Au:GaAs(110) contacts prepared under similar conditions. The observed<br />
fluctuations of the potential at the interface of 2σ ≈ 60 meV are in good<br />
accordance with reported values of BEEM investigations.<br />
HL 44.66 Do 16:30 Poster A<br />
Time-Resolved THz Spectroscopy Of Graphite Sheets —<br />
•Tobias Kampfrath, Luca Perfetti, Christian Frischkorn,<br />
and Martin Wolf — Fachbereich Physik der Freien Universität<br />
Berlin, Arnimallee 14, 14195 Berlin<br />
Pump-and-probe transmission measurements were performed with approximately<br />
30 nm thick highly oriented pyrolitic graphite sheets at<br />
room temperature in air. The sample was excited by a pump pulse centered<br />
at 775 nm. A delayed probe pulse probed the linear optical re-<br />
sponse parallel to the basal plane in a frequency range from about 10<br />
to 30 THz. The field-resolved sampling of the probe pulses allows for<br />
the determination of the temporally changing in-plane component of the<br />
dielectric function. Data analysis shows that the transient signal decays<br />
on timescales of 200 fs and 2 ps, respectively, which we attribute to<br />
carrier relaxation.<br />
HL 44.67 Do 16:30 Poster A<br />
Optical properties of pulsed-laser deposited carbon films —<br />
•P.V. Tolstykh 1 , S.P. Sernov 1 , V.K. Goncharov 2 , M.V. Puzyrou<br />
2 , S. Shokhovets 3 , and G. Gobsch 3 — 1 BNTU Minsk, Skaryna<br />
Prosp. 65, 220027 Minsk, Belarus — 2 Institute of Applied Physics Problems,<br />
Kurchatov Str. 7, 220064 Minsk, Belarus — 3 Institute of Physics,<br />
TU Ilmenau, PF 100565, 98684 Ilmenau, Germany<br />
Optical properties (refractive index n and extinction coefficient k) in a<br />
spectral region from 1.2 eV to 5.5 eV and the thickness d of thin carbon<br />
films were determined by spectroscopic ellipsometry and optical transmission<br />
measurements. The films were deposited on different substrates<br />
(quartz, silicon and bronze) by sputtering of a graphite target placed in<br />
a vacuum chamber (residual gas pressure was 1.3 mPa) using a Nd-glass<br />
laser with wavelength and pulse duration of 1060 nm and 30 ns, respectively.<br />
We studied the dependence of n, k and d on the laser pulse energy<br />
(2 J to 8 J, 100 laser pulses) and the substrate temperature (295 K to<br />
500 K) during the deposition. Further, we compare the properties of the<br />
studied films with those of amorphous hydrogenated diamond-like and<br />
arc-evaporated carbon films and discuss correlations between their optical,<br />
structural and mechanical properties, as well as optimum conditions<br />
for growing films suitable for different applications.<br />
HL 44.68 Do 16:30 Poster A<br />
Undercooling and Solidification of Liquid Silicon — •C. Panofen<br />
1 , R.P. Liu 2 , G. Lohöfer 1 und D.H. Herlach 1 — 1 Institut für<br />
Raumsimulation, DLR, Köln — 2 Yanshan University, Qinhuangdao, P.R.<br />
China<br />
Containerless processing by electromagnetic and electrostatic levitation<br />
techniques was applied to undercool and solidify pure Si melts in a<br />
high purity environment. Without surrounding crucible walls we achieved<br />
large undercoolings of up to 330K below the melting point due to the<br />
reduction of heterogeneous nucleation sites. A pyrometric sensor measured<br />
the sample temperature contactlessly. We stimulated crystallization<br />
by triggering with a silicon wafer at the desired undercooling. The velocity<br />
of the solidification front as a function of undercooling was directly<br />
determined by photo sensors and a high speed camera. We analyzed the<br />
growth behavior within current theories of crystal growth in undercooled<br />
melts. Special emphasis was placed to a microstructure transition from<br />
faceted to dendritic growth. The results of the growth measurements<br />
were correlated to microstructure formation upon undercooling prior to<br />
solidification.<br />
This work was supported by DFG under contract No. HE1601/16-1<br />
and the Sino-German Science Center Beijing.<br />
HL 44.69 Do 16:30 Poster A<br />
Züchtung von Silizium-Nanowhiskern mittels Molekularstrahlepitaxie<br />
(MBE) — •Luise Schubert, Peter Werner,<br />
Nikolai Zakharov, Gerhard Gerth, Vadim Talalaev und<br />
Ulrich Gösele — Max-Planck-Institut für Mikrostrukturphysik,<br />
06120 Halle<br />
Das Interesse an der Züchtung und Anwendung von Halbleiter-<br />
Nanostrukturen ist in den vergangenen Jahren stark gestiegen. Wir<br />
präsentieren die Möglichkeit, Si- Nanowhisker mittels Molekularstrahlepitaxie<br />
(MBE) erfolgreich herzustellen. Vor der Si-Abscheidung wurden<br />
die (111)-Silizium Substrate mit Gold bedampft, welches in Form von<br />
Clustern auf der Substratoberfläche als Keime für das Whiskerwachstum<br />
dient. Die bereits bekannte Wachstumstheorie, der sogenannte ”vaporliquid-solid”-<br />
Mechanismus (VLS), liegt in dieser Art der Herstellung in<br />
einer abgewandelten Form vor. Die Strukturen wurden mittels SEM und<br />
TEM analysiert. Dabei kann gezeigt werden, dass die Länge mit der Breite<br />
der Whisker korreliert. Der modifizierte VLS-Wachstumsmechanismus<br />
wird diskutiert.