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U. Glaeser

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FIGURE 2.95 Low-voltage trends in digital circuits.<br />

FIGURE 2.96 MTCMOS circuit scheme.<br />

and shows the trend in power consumption per basic gate, normalized to the power consumption for<br />

5 V operation. The supply voltage for 0.05 µm generation LSI circuits is predicted to be 0.5 V in the year<br />

2011, a reduction of two orders of magnitude from the 5 V operation of the 0.5 µm generation. However,<br />

it is possible to realize wearable information equipment that requires ultra-low-power-consumption<br />

ahead of that low-voltage, low-power consumption time trend, even without waiting for the finer processes<br />

of 2011, by using a combination of FD-SOI devices and MTCMOS circuits [24] or adiabatic<br />

charging circuits [25]. NTT is proceeding along a low-voltage research roadmap that shows 1 V operation<br />

in the year 2000 and 0.5 V operation sometime between 2003 and 2005.<br />

MTCMOS (Multi-Threshold CMOS) circuits [24] are an effective means to achieve lower operating<br />

voltages in digital circuits (Fig. 2.96). These circuits are constructed of MOSFETs that have two different<br />

© 2002 by CRC Press LLC<br />

1990 1995 2000 2005 2010<br />

1<br />

500 nm<br />

350 nm<br />

0.1<br />

0.01<br />

0.001<br />

MTCMOS/bulk-Si<br />

device<br />

SL<br />

Variable threshold<br />

power-switch<br />

Fully Depleted<br />

Low-V th MOSFET<br />

250 nm<br />

180 nm<br />

From 1999 SIA Roadmap<br />

130 nm<br />

100 nm<br />

1.2 V<br />

70 nm<br />

20 MHz<br />

1 V<br />

50 nm<br />

100 MHz<br />

0.5 V<br />

100 MHz<br />

MTCMOS/0.18-<br />

0.15- µ m FD-SOI<br />

device<br />

V DD = 0.5 V<br />

Year<br />

Adiabatic Charging<br />

Circuit/ 0.1- µ m FD-SOI<br />

device<br />

Virtual V DD<br />

Low-threshold<br />

CMOS logic gaters<br />

Partially Depleted<br />

High-V th MOSFET

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