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U. Glaeser

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Memory<br />

Cell<br />

Bit#<br />

Bit<br />

FIGURE 10.78 A basic column in a memory array.<br />

New process generations are designed such that the current per unit width of transistor does not<br />

change significantly. So, although scaling reduces the size of the driving transistor ND 1, I sat remains almost<br />

the same. C BL consists mainly of two components, metal line capacitance and diffusion contact capacitance.<br />

Contact capacitance does not scale linearly with each process generation, but the metal bit lines<br />

scale due to smaller cell. This applies to Eq. (10.25) as well. To get the same access time, the number of<br />

cells connected to a column must be reduced. However, this trend is much more drastic for 2T-DRAM<br />

because �V is proportional to V s. For example, in a typical 0.18 µm technology to achieve access time<br />

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