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Abstracts Book - IMRC 2018

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• SB4-P023<br />

SYNTHESIS AND CHARACTERIZATION OF ZnO THIN FILMS BY CVD<br />

TECHNIQUE FOR THE DEVELOPMENT OF FET TRANSISTORS<br />

Antonio Gallardo 1 , Alicia Vera Marquina 1 , Dainet Berman Mendoza 1 , Jose R Noriega 1 , Rafael<br />

Garcia Gutierrez 1 , Ricardo Rangel 2 , Antonio Ramos Carrazco 1<br />

1<br />

Universidad de Sonora, Departamento de Investigación en Fisica, Mexico. 2 Universidad<br />

Michoacana de San Nicolás de Hidalgo, Facultad de ingenieria quimica, Mexico.<br />

The zinc oxide (ZnO) is a semiconductor material with a wide direct band-gap<br />

(3.37 eV) and high value exciton binding energy (60 meV), making it a promising<br />

candidate for the design of thin film transistor (TFT). Besides this material have<br />

excellent optical properties, photoelectric and piezoelectric with application in<br />

visual screens, varistors and gas sensors. In this work, the synthesis of ZnO<br />

grown on SiO2/Si substrates by a homemade CVD system is reported. This<br />

semiconductor was deposited using metallic zinc as precursor and ultra-high<br />

purity oxygen. A factorial design experiment was employed to analyze the main<br />

parameters of the growth procedure. The samples were characterized by<br />

photoluminescence (PL), cathodoluminescence, scanning electron microscope<br />

(SEM), Raman spectroscopy and X-ray diffraction (XRD). The PL characterization<br />

shows the near band emission (NBE) and the green emission at 383 nm and 508<br />

nm, respectively. In order to compare the optical response, the results CL<br />

spectra were performed for this oxide at room temperature. The characteristic<br />

Raman peaks for the ZnO are reported. The SEM images show the morphology<br />

of the ZnO samples with varied structures such as rods, wires and islands.<br />

Finally, the crystalline structure of the samples was identified using XRD<br />

patterns. The I-V curves of a FET transistor based on a ZnO layer and a SiO2/Si<br />

substrate are presented.<br />

Acknowledgment:<br />

The authors express our Acknowledgments to the Universidad de Sonora<br />

(Unison) and to the laboratorio nacional de nanofabricación nanoFAB (UNISON).<br />

This work was supported by CONACyT Mexico, Project No 242508.<br />

Keywords: ZnO, Chemical vapor deposition, transistor<br />

Presenting authors email: antonio.ramos@unison.mx

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