Abstracts Book - IMRC 2018

• SC4-P031
GROWTH OF CdS THIN FILMS BY CHEMICAL
BATH DEPOSITION REDUCING THE AMOUNT OF CHEMICAL
WASTE PRODUCED
Roberto Carlos Ruiz Ortega 1 , Maria de Lourdes Albor Aguilera 1 , Miguel Angel González Trujillo 2 ,
Karla Gutierrez Zayas Bazán 1
1
Instituto Politécnico Nacional - IPN, Departamento de Fisica, Mexico. 2 Instituto Politécnico
Nacional - IPN, Departamento de Formación Básica, Mexico.
Currently in the market mono and polycrystalline silicon technology is available
however the modules production of this technology represents high costs for
the industry. In this way, new technologies have been studied to enter the
market with considerably accessible costs. CdS / CdTe technology has shown as
an alternative with good results at lower costs. CdS thin films production has
been done by chemical bath deposition technique being the best results
obtained, nevertheless in 100 cm 2 areas the CdS deposit by chemical bath
produces a lot of chemical waste water that represent an environment risk. In
this work CdS thin films deposition by chemical bath is reported achieving a
chemical waste reduction in 80% with respect to the conventional technique.
The thin films obtained have adequate physical properties.
Acknowledgment:
CeMIE-SOL P25. SIP-20180398. SIP-20180439
Keywords: CdS, chemical bath deposition, waste reduction
Presenting authors email: robertocarlosr@live.com.mx