Abstracts Book - IMRC 2018

• SA1-P037
CHARACTERZATION AND PROPERTIES OF THIN FILMS RGO IN
SILICON
Alejandra Daniela Mercado 1 , Juan Mendez 1 , Victor Hugo Castrejón 1
1 Tecnológico de Estudios Superiores de Jocotitlán, Ingeniería en materiales, Mexico.
We start with the Hummers technique in order to obtain Graphite Oxide, once
that we obtained a black paste, then we perform a heat treatment using a
conventional microwave, the result is a black dust, diferents probes of
caracterization like as, SEM, AFM and FTIR were realized, our results shows a
material with severals hundreds of sheets, that material is called Reduced
Graphene Oxide (RGO) and it has a wide interesting properties, due it has
hydroxyl and carboxyl functional groups, making it a stable material for example
in wáter, etanol and electrolitic solution. Using the Spin coating technique, in
order to appliying thin films of RGO in to a flat substrate of silicon, the substrate
is rotated at high speed in order to spread the coating material by centrifugal
force, then the flat substrate is submitted a heat treatment (250-500 ° C) so that
we get an annealing. SEM and STM characterization show that an homogeneous
RGO thin film is formed, and we can observe the structure of RGO respectively.
The applications of this material are focused for example to photovoltaic cells
and more efficient technological devices.
Acknowledgment:
This work was supported by Research Department of Tecnológico de Estudios
Superiores de Jocotitlán and partially supported by COMECYT
Keywords: Reduced Graphene Oxide, Silicon, Characterization
Presenting authors email: aleda.mera.264@gmail.com