Abstracts Book - IMRC 2018

• SC4-P104
SYNTHESIS OF MOLYBDENUM OXIDE THIN FILMS BY LASER
ABLATION AT DIFFERENT OXYGEN PRESSURES
Ivette Alejandra Ramos Díiaz 1 , Gilberto Gomez Rosas 2 , Dagoberto Cardona Ramírez 1 , Enrique
Camps 3 , Enrique Campos Gonzalez 3 , Miguel Angel Santana Aranda 2 , Jose Guadalupe Quiñones 2
1
Instituto Tecnológico y de Estudios Superiores de Occidente A.C., Departamento de Fisica y
Matematicas, Mexico. 2 Universidad de Guadalajara, Departamento de Fisica, Mexico. 3 Instituto
Nacional de Investigaciones Nucleares (ININ), Departamento de Fisica, Mexico.
Molybdenum oxide (MoOx) is a transition metal-oxide (TMO) with a great
technical interest due to its remarkable optical and electronic properties. MoOx
has the potential to be used in a variety of applications in the field of crystalline
silicon and perovskite solar cells, chemical catalysis applications and hydrogen
separation. Besides TMO can be switch between two different optical states
prompted by photochromic, thermochromic or electrochromic
effect. Molybdenum oxide thin films have been prepared by different methods
such as sol-gel technique, magnetron sputtering, pulsed laser deposition (PLD)
and chemical vapor deposition (CVD). In this work we used the PLD technique to
study the influence of the deposition pressure has on the parameters (mean
kinetic energy and ion density) of the plasma generated by the laser ablation of
Metallic molybdenum in an oxygen atmosphere, in order to optimize and
control the synthesis of MoOx thin films. The results presented in this work are
discussed as a function of the background pressure. For the ablation process, a
Nd:YAG pulsed laser with a wavelength of 1064 nm was focused on the surface
of Mo solid target for 20 minutes. The background gas was a mixture of 80%
argon/ 20% oxygen. The pressure values were of 5 and 10
mTorr. Characterization of the thin films was carried out by Raman
Spectroscopy, Scanning Electron Microscope (SEM), X-Ray Photoelectron
Spectroscopy (XPS), X-Ray Diffraction (XRD) and Ultraviolet-Visible Spectroscopy
(UV-Vis). According to XRD and Raman measurements, the crystalline structure
depends on the pressure, besides XPS results show that the oxidation state in
thin films is also influenced by the deposition pressure.
Acknowledgment:
Sergio Oliva for helping ud with the XRD characterization of MoOx thin
films. Guadalupe Cardenas for helping us with the grazing angle XRD
characterization of MoOx thin films. Ruben Montelongo for helping ud with the