Abstracts Book - IMRC 2018

• SF2-P053
ELECTROCHEMICAL, MICROSTRUCTURAL, COMPOSITIONAL AND
MAGNETIC PROPERTIES OF CONI THIN FILMS
Sethuramachandran Thanikaikarasan 1 , Thaiyan Mahalingam 2 , Subramaniam Velumani 3
1 Saveetha School of Engineering, Saveetha Institute of Medical and Technical Sciences,
Department of Physics, India. 2 Alagappa University, School of Physics, India. 3 Centro de
Investigación y de Estudios Avanzados del IPN - CINVESTAV, Department of Electrical
Engineering, Mexico.
Iron group of metallic alloys are considered as important materials found
applications in inudustrial and technological point of view due to its
appropriate magnetic, mechanical, physical and chemical properties [1-2].
Cobal Nickel is one of the metallic alloys widely used in hard drive industries,
micro sensors and micro inductors [3-4]. Electrochemical deposition become
visible due to simple, low cost of synthesize, low temperature processing, less
time consuming and easy way of process to control the deposition parameters
as well as composition of the electrolytic bath etc., [5-7]. CoNi thin films have
been grown by galvanostatic cathodic electrodeposition onto pre-cleaned
copper substrates from sulfate baths. The bath composition for the preparation
of CoNi thin films are: 0.206 M CoSO4, 0.2M NiSO 4 , 0.4M H 3 BO 3 and 0.5M NaCl.
The other deposition conditions are; Solution pH: 1.0 to 5.0, bath temperature:
30 o C, current density: 10 mA/cm 2 and deposition time: 40 minutes. X diffraction
patterns showed that the prepared films found to exhibit face centred cubic
structure with preferential orientation along (200) plane. Scanning electron
microscopy and Energy dispersive X-ray analysis indicated that the prepared
films has smooth surface with well defined stoichiometry. Magnetic properties
showed that the prepared films have coercivity and saturation magnetization
value around 765 and 5380 Oe, respectively.
References
[1]. T.Mahalingam, K.Sundaram, S.Velumani, M.Raja, S.Thanikaikarasan, Yong
Deak Kim, Rene Asomoza, Advanced Materials Research 68, pp 52-59 (2009)
[2]. S.Armyanov, Electrochimica Acta 45,3323 (2000)
[3]. E.Gomez, E.Valles, Journal of Applied Electrochemistry 32,693 (2002)
[4]. E.Gomez, E.Valles, Journal of Applied Electrochemistry 29,803 (2002)
[5]. Sethuramachandran Thanikaikarasan, Ionics (doi.org/10.1007/s11581-017-
2292-6)
[6]. P.Jeyakumar, S.Thanikaikarasan, B.Natarajan, Journal of Materials Science :