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Abstracts Book - IMRC 2018

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• SF2-O001 Invited Talk<br />

CRYSTAL GROWTH PHENOMENA OF CHALCOGENIDE<br />

MULTILAYERS WITH ATOMIC-SCALE RESOLUTION VIA<br />

MOLECULAR DYNAMICS<br />

David Zubia 1 , Rodolfo Aguirre 1 , Jose Juan Chavez 2 , Sharmin Abdullah 3 , Xiaowang Zhou 2<br />

1 The University of Texas at El Paso, Electrical and Computer Engineering, United States. 2 Sandia<br />

National Laboratories, Mechanics of Materials Department, United States. 3 The University of<br />

Texas at El Paso, Computational Science Department, United States.<br />

Important crystal growth phenomena of single- and poly-crystalline<br />

chalcogenide multilayers are studied with atomic-scale resolution using<br />

molecular dynamics. Studying the growth evolution of chalcogenide multilayers<br />

with atomic scale resolution is crucial for the development of infrared imaging,<br />

radiation detectors, and photovoltaic devices. Molecular dynamics is a powerful<br />

simulation technique that essentially solves Newton’s equation of motion for a<br />

system containing 100s of thousands of atoms. The technique yields threedimensional<br />

information of atom positions as a function of time. This enables<br />

visualization of crystal and defect evolution. The molecular dynamics capability<br />

used in this work is based on a Stillinger-Weber potential and is able to simulate<br />

Zn, Cd, S, Te, Cu, Se, and Hg giving it wide latitude to study a variety of material<br />

stacks and deposition conditions. Time-resolved 3D visualizations of any region<br />

within the material stack can be used to investigate crystalline and defect<br />

structure evolution. In this work, atom diffusion, grain boundary migration and<br />

dislocation dynamics are studied in single- and poly-crystalline films. Predicted<br />

crystal and defect structures are shown to be in remarkable agreement with<br />

experimental results. Atom diffusion through defected and pristine regions are<br />

analyzed. It is observed that grain boundaries and stacking faults act as<br />

transport channels for diffusing atoms. Secondly, propagation of Σ3, Σ7, and Σ11<br />

coincidence-site lattice and stacking fault grain boundaries in single and<br />

polycrystalline films is investigated. Thermally activated grain boundary<br />

migration is observed; however, boundary character has a strong influence on<br />

mobility. Finally, dislocation interactions are also studied during crystal growth.<br />

It is observed that dislocation interactions nucleate at crystal surfaces and<br />

interfaces and propagate much faster than the growth rate. Videos of the<br />

dislocation evolution are presented showing fascinating misfit and threading<br />

dislocation interaction dynamics. These insights are useful to interpret<br />

experimental results and guide future investigations.

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